Liquid purification or separation – With alarm – indicator – register – recorder – signal or... – Responsive to fluid flow
Patent
1978-01-03
1980-05-06
Cintins, Ivars C.
Liquid purification or separation
With alarm, indicator, register, recorder, signal or...
Responsive to fluid flow
210 37B, 210 38B, 210 40, B01D 1506
Patent
active
042016657
ABSTRACT:
Nonstoichiometric carbon-sulfur compounds have been found to be effective adsorbents for removing a wide variety of organic and/or inorganic materials from liquids, preferably polar liquids. Removal of biorefractory organics, such as aromatics, is particularly effective using such compounds. The spent adsorbent may then be regenerated.
REFERENCES:
patent: 3965036 (1976-06-01), Himmelstein
patent: 4048061 (1977-09-01), Blytas
patent: 4053396 (1977-10-01), Trense et al.
B. R. Puri, "Surface Complexes on Carbons", Chapter in Chemistry and Physics of Carbon, vol. 6, Marcel Dekker, New York, 1970.
B. R. Puri, "Adsorption at Interfaces", ACS Symposium Series, vol. 8, pp. 212-224, 1975.
B. R. Puri et al., Carbon, vol. 11, pp. 329-336, Pergamon Press, Great Britain, 1973.
Puri et al., Carbon, vol. 9, pp. 123-134, Pergamon Press, Great Britain, 1971.
Blayden et al., Carbon, vol. 5, pp. 533-544, Pergamon Press, Great Britain, 1967.
Maruyama et al., Journal Water Pollution Control Federation, vol. 47, No. 5, pp. 962-975, May 1975.
Lawson et al., "Water--1973", AICHE Symposium Series 135, vol. 70, pp. 544-584, 1974.
Chang Chin H.
Longo John M.
Savage David W.
Cintins Ivars C.
Ditsler John W.
Exxon Research & Engineering Co.
Mazer Edward H.
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