Use of multiple masks to control uniformity in coating depositio

Details Use of multiple masks to control uniformity in coating depositio Use of multiple masks to control uniformity in coating depositio

1998-07-10

2000-05-16

Beck, Shrive

Coating processes

Optical element produced

427282, 427402, 427526, 427561, 20419211, B05D 136, C23C 1404, C23C 1446

Patent

active

060634367

ABSTRACT:
The uniformity of individual layers of multiple coating materials deposited on a substrate in a vacuum deposition process (such as for manufacturing mirrors for use in ring laser gyroscopes) is improved by an apparatus and method that include changing the masks placed in front of the substrate upon which the coating materials are to be deposited. Separate masks are tuned for each particular coating material to compensate for the unique plume shape of the material, and provide a uniform deposition of that particular coating material. Each mask is positioned in front of the substrate when the material for which the mask has been tuned is being deposited. The masks are changed when the coating material is changed, without venting the chamber.

REFERENCES:
patent: 4142958 (1979-03-01), Wei et al.
patent: 4430790 (1984-02-01), Ohta
patent: 4793908 (1988-12-01), Scott et al.
patent: 5156727 (1992-10-01), Bjornard et al.
patent: 5776359 (1998-07-01), Schultz et al.

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