Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1991-03-12
1992-04-21
Shaver, Paul F.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
C01B 3300, C01B 3304
Patent
active
051066041
ABSTRACT:
Hydridospherosiloxanes and soluble hydrogensilsesquioxane resin are produced having the formula (HSiO.sub.3/2).sub.n, where n is an even integer greater than 8. A biphasic reaction medium is prepared, having a first solvent phase and a second solvent phase. The first solvent phase can contain a hydrocarbon solvent, such as an alcohol. The first solvent phase can be methanol or ethanol. The second solvent phase is a concentrated solution of a metal salt, such as Fe(III) in a polar organic solvent and water. A silicon compound represented by the formula: HSiX.sub.3, where X is a group which is hydrolyzable in the solvent of said first solvent phase, is added to the biphasic reaction medium. X can be Cl or OCH.sub.3. The first solvent phase is separated from the second solvent phase and then the separated first solvent phase is treated with a metal salt, such as sodium or potassium carbonate. Slow evaporation of the first solvent phase solvent is employed to isolate a mixture of crystals of (HSiO.sub.3/2).sub.8, and (HSiO.sub.3/2).sub.10. The crystal mixture is washed with a hydrocarbon solvent and crystals of (HSiO.sub.3/2).sub.8 are isolated.
REFERENCES:
patent: 3615272 (1971-10-01), Collins et al.
patent: 4808653 (1989-02-01), Haluska et al.
patent: 4895914 (1990-01-01), Saitoh et al.
Parker Sheldon H.
Shaver Paul F.
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