Use of ketal blocked quinones to reduce post-process D.sub.min i

Details Use of ketal blocked quinones to reduce post-process D.sub.min i Use of ketal blocked quinones to reduce post-process D.sub.min i

1982-06-28

1983-10-04

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Diffusion transfer process, element, or identified image...

430212, 430223, 430236, 430242, 430486, 430467, 430955, G03C 140, G03C 554, G03C 110

Patent

active

044079281

ABSTRACT:
Photographic assemblages and processes are described employing positive-working redox dye-releasers and a processing composition containing a ketal blocked quinone which is soluble therein. After processing, when the pH is lowered, the free quinone is released for reaction with residual electron transfer agent present in the assemblage to prevent it from reacting with the dye releaser, which would otherwise cause further dye release. D.sub.min stability is thereby improved.

REFERENCES:
patent: 3868252 (1975-02-01), Campbell et al.
patent: 3928043 (1975-12-01), Ciurca, Jr.
patent: 3998640 (1976-12-01), Ciurca et al.
patent: 4046652 (1977-09-01), Pistorius et al.
patent: 4088488 (1978-05-01), Chang et al.
patent: 4139379 (1979-02-01), Chasman et al.
patent: 4139389 (1979-02-01), Hinshaw et al.
patent: 4160109 (1979-07-01), Pistorius
patent: 4203811 (1980-05-01), Cramer
patent: 4353975 (1982-10-01), Janssens et al.

Affiliated with

Also associated with

Rating

Use of ketal blocked quinones to reduce post-process D.sub.min i does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Use of ketal blocked quinones to reduce post-process D.sub.min i, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Use of ketal blocked quinones to reduce post-process D.sub.min i will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-974173