Use of hydrogen silsesquioxane resin fractions as coating materi

Details Use of hydrogen silsesquioxane resin fractions as coating materi Use of hydrogen silsesquioxane resin fractions as coating materi

1991-06-17

1992-06-02

Lusignan, Michael

Coating processes

Heat decomposition of applied coating or base material

427377, 427379, 427387, B05D 302

Patent

active

051185300

ABSTRACT:
The present invention relates to hydrogen silsesquioxane resin (H-resin) fractions derived from an extraction process using one or more fluids at, near or above their critical state. These fractions can comprise narrow molecular weight fractions with a dispersity less than about 3.0 or fractions useful for applying coatings on substrates. The invention also relates to a method of using these fractions for forming ceramic coatings on substrates.

REFERENCES:
patent: 4911992 (1990-03-01), Haluska et al.

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