Use of HALS compounds

Details Use of HALS compounds Use of HALS compounds

1995-10-20

1998-01-06

Morgan, Kriellion S.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Processes of preparing a desired or intentional composition...

526263, 526265, C08K 53435

Patent

active

057055459

ABSTRACT:
A compound of formula I for use in stabilizing polymeric material against effects such as light and heat ##STR1## in which R is hydrogen; oxygen; --OH; C.sub.1-24 alkyl; --O--CO--C.sub.1-24 alkyl; --O--CO--C.sub.1-24 alkyl; --O--CO-phenyl or --COR.sub.5 ; where R.sub.5 is --C(R.sub.3).dbd.CH.sub.2, C.sub.1-6 alkyl, phenyl, CO--C.sub.1-24 alkyl, --CO--phenyl, --NR.sub.7 R.sub.8, --CH.sub.2 --C.sub.6 H.sub.5, --CO--OC.sub.1-12 alkyl or --COOH; where R.sub.3 is hydrogen or C.sub.1-4 alkyl; R.sub.7 is hydrogen, C.sub.1-12 alkyl, C.sub.5-6 cycloalkyl, phenyl, phenyl-C.sub.1-4 alkyl or C.sub.1-12 alkylphenyl and R.sub.8 is C.sub.1-12 alkyl or hydrogen,
each R.sub.1, independently, is --CH.sub.3 or --CH.sub.2 (C.sub.1-4 alkyl) or both groups R.sub.1 form a group --(CH.sub.2).sub.5 --; and
each R.sub.2, independently, is --CH.sub.3 or --CH.sub.2 (C.sub.1-4 alkyl) or both groups R.sub.2 form a group --(CH.sub.2).sub.5 --.
A is --O-- or --N(C.sub.1-4 alkyl)-- or --NH--
R.sub.9 is hydrogen or methyl, and
R.sub.10 is an aromatic single ring or an aromatic fused 2 to 3 ring group or a heteroaromatic single ring or a a heteroaromatic fused 2 or 3 ring group.

REFERENCES:
patent: 4238613 (1980-12-01), Rasberger et al.
Leaversuch, "Polyolefins gain higher performance from new catalyst technologies", Modern Plastics, Oct. 1991.

Affiliated with

Also associated with

Rating

Use of HALS compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Use of HALS compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Use of HALS compounds will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2329607