Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1995-03-01
1996-07-23
Le, Hoa Van
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430531, 430532, G03C 1795
Patent
active
055388418
ABSTRACT:
The present invention is a polyester film base which has a surface approximately 5 nm thick. The surface of the film base has been altered to include about 6 to 15 atomic percent nitrogen in the form of imines, secondary amines and primary amines in the ratio of about 1:1:2. The invention also includes a film base whose surface includes oxygen in the form of hydroxyl, ether, epoxy, carbonyl or carboxyl groups wherein the oxygen is about 4 to 10 atomic percent above the original surface content of the base. The polyester film base can be either polyethylene terephthalate or polyethylene naphthalate.
REFERENCES:
patent: 3288638 (1966-11-01), Paassen et al.
patent: 3411908 (1968-11-01), Crawford et al.
patent: 3531314 (1970-09-01), Kerr et al.
patent: 3607345 (1971-09-01), Thomas et al.
patent: 3630742 (1971-12-01), Crawford et al.
patent: 3661735 (1972-05-01), Drelich
patent: 3833403 (1974-09-01), Kogure et al.
patent: 3837886 (1974-09-01), Tatsuta et al.
patent: 3860427 (1975-01-01), Matsuo et al.
patent: 3874877 (1975-04-01), Omichi et al.
patent: 3888753 (1975-06-01), Klikka et al.
patent: 4009037 (1977-02-01), Mann et al.
patent: 4055685 (1977-10-01), Bayer et al.
patent: 4087574 (1978-05-01), Jamaguchi et al.
patent: 4229523 (1980-10-01), Ohta et al.
patent: 4267202 (1981-05-01), Nakayama et al.
patent: 4292032 (1981-09-01), Luke
patent: 4363872 (1982-12-01), Ealding et al.
patent: 4394442 (1983-07-01), Miller
patent: 4451497 (1984-05-01), Dolezalek et al.
patent: 4645602 (1987-02-01), Asakura et al.
patent: 4663236 (1987-05-01), Lanthonsen et al.
patent: 4689359 (1987-08-01), Ponticello et al.
patent: 4695532 (1987-09-01), Ponticello et al.
patent: 4933267 (1990-06-01), Ishigski et al.
patent: 4954430 (1990-09-01), Ishigski et al.
patent: 5004669 (1991-04-01), Yamada et al.
patent: 5073455 (1991-12-01), Nose et al.
patent: 5244780 (1993-09-01), Strobel et al.
patent: 5326689 (1994-07-01), Murayama
Chen Janglin
Gerenser Louis J.
Glocker David A.
Grace Jeremy M.
Eastman Kodak Company
Le Hoa Van
Rosenstein Arthur H.
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