Optics: measuring and testing – Inspection of flaws or impurities – Having predetermined light transmission regions
Patent
1997-07-10
1998-12-08
Font, Frank G.
Optics: measuring and testing
Inspection of flaws or impurities
Having predetermined light transmission regions
G01N 2100
Patent
active
058478213
ABSTRACT:
A method for navigating directly to defects on a blank wafer caused by particles dropped from process tools. A blank wafer is marked with fiducial marks, the number of initial defects on the blank wafer is determined and the position coordinates of the initial defects and the fiducial marks are recorded. The blank wafer is placed into a selected process tool and the additional defects that are caused by particles dropped from the process tool are detected in an inspection tool and their position coordinates are determined and recorded as well as the position coordinates of the fiducial marks. The blank wafer is then placed in an analysis tool that is able to navigate directly to each of the additional defects at a high magnification using the position coordinates of the fiducial marks.
REFERENCES:
patent: 5479252 (1995-12-01), Worster et al.
patent: 5640236 (1997-06-01), Nagashima
"Optimization of Wafer Surface Particle Position Map Prior to Viewing Wigh an Electron Microscope," by Man-Ping Cai, Yuri Uritsky, Patrick D. Kinney, American Institute of Physics, 1996, pp. 243-247.
Tracy Bryan Mitchell
Wollesen Donald L.
Advanced Micro Devices , Inc.
Font Frank G.
Merlino Amanda
Nelson H. Donald
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