Use of amorphous carbon film as a hardmask in the...

Optical waveguides – Planar optical waveguide

Reexamination Certificate

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C385S130000, C385S131000

Reexamination Certificate

active

07079740

ABSTRACT:
Methods are provided for forming optical devices, such as waveguides, with minimal defect formation. In one aspect, the invention provides a method for forming a waveguide structure on a substrate surface including forming a cladding layer on the substrate surface, forming a core layer on the cladding layer, depositing an amorphous carbon hardmask on the core layer, forming a patterned photoresist layer on the amorphous carbon hardmask, etching the amorphous carbon hardmask, and etching the core material.

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