Use of a particulate packed bed at the inlet of a vertical tube

Details Use of a particulate packed bed at the inlet of a vertical tube Use of a particulate packed bed at the inlet of a vertical tube

1990-09-24

1991-10-08

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118725, 118730, C23C 1600

Patent

active

050544209

ABSTRACT:
A gas distributing device is provided for a Metal Organic Chemical Vapor Deposition (MOCVD) reactor. The gas distributing device comprises a packed bed of discrete particles located in the inlet of the reactor to provide a vortex-free flow of reactant gas mixture towards the susceptor within the reactor chamber. The packed bed of discrete particles is of sufficient depth to provide a series of tortuous interconnecting channels around and between the particles and through the bed. A porous support is provided for the packed bed in the inlet of the reactor chamber. The porous support device adjacent the reactor chamber permits a reactant gas mixture after having passed through the packed bed to enter the reactor chamber.

REFERENCES:
patent: 3996025 (1976-12-01), Gulden
Wang, Flow Visualization Studies for Optimization of OMVPE Reactor Design, 3rd International Conf. on Metalorganic Vapor Phase Epitaxy, Universal City, Calif., 1986, sponsored by the American Assoc. for Crystal Growth.

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