Unsaturated epoxy ester with quaternary ammonium and phosphate g

Details Unsaturated epoxy ester with quaternary ammonium and phosphate g Unsaturated epoxy ester with quaternary ammonium and phosphate g

1995-06-06

1996-04-30

Sellers, Robert E.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

522 39, 525502, 525531, G03F 7004

Patent

active

055126073

ABSTRACT:
This invention provides a photosensitive resin composition which can be developed using water and can form a resist layer having superior hardness, adhesion and water resistance.
The photosensitive resin composition of the present invention is characterized by containing an unsaturated epoxyester compound prepared by esterifying some of the epoxy side groups of an unsaturated epoxyester compound, and then reacting the remained epoxy groups of the epoxyester compound with a tertiary amine and acid component, such as phosphoric acid, a monoester of phosphoric acid or a diester of phosphoric acid or combination thereof, to convert the epoxy groups into quaternary ammonium salt groups having phosphate anions.

REFERENCES:
patent: 3929743 (1975-12-01), Sramek
patent: 3953309 (1976-04-01), Gilano et al.
patent: 4025692 (1977-05-01), Yamagishi et al.
patent: 4079028 (1978-03-01), Emmons et al.
patent: 4100047 (1978-07-01), McCarty
patent: 4115328 (1978-09-01), Bozzi et al.
patent: 4133909 (1979-01-01), Spencer
patent: 4151143 (1979-04-01), Blank et al.
patent: 4186069 (1980-01-01), Muzyczko et al.
patent: 4293476 (1981-10-01), Moore et al.
patent: 4304703 (1981-12-01), Das
patent: 4361640 (1982-11-01), Pine
patent: 4426485 (1984-01-01), Hoy et al.
patent: 4434278 (1984-02-01), Skiscim
patent: 4510230 (1985-04-01), Coveleskie et al.
patent: 4564580 (1986-01-01), Ichimura et al.
patent: 4713298 (1987-12-01), Hung et al.
patent: 4743698 (1988-05-01), Ruffner et al.
patent: 4943513 (1990-07-01), Lipson et al.
patent: 4950580 (1990-08-01), Hilger
patent: 4952481 (1990-08-01), Seio et al.
patent: 4965294 (1990-10-01), Ohngemach et al.
patent: 5045435 (1991-09-01), Adams et al.
patent: 5168087 (1992-12-01), LiBassi et al.
patent: 5178988 (1993-01-01), Leech et al.
patent: 5232815 (1993-08-01), Browne et al.
patent: 5320933 (1994-06-01), Lundy et al.
patent: 5364736 (1994-11-01), Eramo, Jr. et al.
patent: 5364737 (1994-11-01), Barr
patent: 5387494 (1995-02-01), Barr et al.
patent: 5389495 (1995-02-01), Barr
F. W. Billmeyer, Textbook of Polymer Science (2d 1962), pp. 343-347.
F. A. Bovey, Emulsion Polymerization (1955), pp. 271-290.
G. E. Ham. Kinetics and Mechanisms of Polymerization, vol. 2 (1967), pp. 259-290.
Chiou et al., Emulsified Photoresist for Printed Circuit Imaging, MRL Bull. Res. Dev.., vol. 2, No. 2 (1988) pp. 13-17.

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