Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-09-12
2006-09-12
Chawan, Sheela (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S199000, C382S224000, C382S278000, C438S014000
Reexamination Certificate
active
07106897
ABSTRACT:
A method and apparatus for analyzing patterns in semiconductor wafers wherein the patterns are compared to a plurality of patterns stored in a common pattern library. A spatial pattern recognition engine is operable to receive a first set of data corresponding to a pattern on a semiconductor wafer and to generate a normalized contour representation of said first data set. A pattern analyzer compares the normalized data set to a plurality of reference contour data sets stored in a common pattern data reference library and generates a correlation label associating the first data set with one of the plurality of reference contour data sets. The label associated with the first data set is stored in a label storage database that can be accessed to perform subsequent analysis on the data associated with a specific wafer. The system can be used to analyze multiple types of patterns, including defect data, bin data, positional parameter data and in-line site data.
REFERENCES:
patent: 5240866 (1993-08-01), Friedman et al.
patent: 5301129 (1994-04-01), McKaughan et al.
patent: 5539752 (1996-07-01), Berezin et al.
patent: 5544256 (1996-08-01), Brecher et al.
patent: 5787190 (1998-07-01), Peng et al.
patent: 5859698 (1999-01-01), Chau et al.
patent: 5886909 (1999-03-01), Milor et al.
patent: 5913105 (1999-06-01), McIntyre et al.
patent: 5949901 (1999-09-01), Nichani et al.
patent: 5982920 (1999-11-01), Tobin, Jr. et al.
patent: 5991699 (1999-11-01), Kulkarni et al.
patent: 6210983 (2001-04-01), Atchison et al.
patent: 6246787 (2001-06-01), Hennessey et al.
patent: 6292582 (2001-09-01), Lin et al.
patent: 6338001 (2002-01-01), Steffan et al.
patent: 6477685 (2002-11-01), Lovelace
U.S. Appl. No. 09/351,540, filed Jul. 12, 1999, Entitled “Automatic Defect Source Classification,” Inventors: Kirsch, Travis; Hance, Byron; Webb, Carroll.
McIntyre Michael G.
Morris James E.
Advanced Micro Devices , Inc.
Chawan Sheela
Hamilton Gary W.
Hamilton & Terrile LLP
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