Universal calibration standard for surface inspection systems

Optics: measuring and testing – Standard

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356237, G01N 2188

Patent

active

046360735

ABSTRACT:
A universal calibration standard for surface inspection systems has a plurality of hemispherical pads which simulate the liquid scattering due to particulate contamination. The hemispherical pads scatter light irrespective of angles of illumination and detection and of rotational orientation, and are fabricated using ball-limiting metallurgical techniques. Any number and sizes of pads can be arranged on a substrate and the standard can be repeatedly cleaned, thereby having a long useful life.

REFERENCES:
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patent: 4135821 (1979-01-01), Pechin et al.
patent: 4215939 (1980-08-01), Miller et al.
patent: 4386850 (1983-06-01), Leahy
patent: 4512659 (1985-04-01), Galbraith et al.
C. A. Gaston, "Standard Wafer for Intensity and Focus Testing," IBM Tehnical Disclosure Bulletin, vol. 24, No. 11A, pp. 5587-5589, Apr. 1982.
C. S. Gati, "Calibration Standard for Oblique Light-Type Particle Detection/Measurement Instruments," IBM Technical Disclosure Bulletin, vol. 24A, No. 11B, pp. 6064-6067, Apr. 1982.
Technical Bulletin, No. 4, Tencor Instruments, Mar. 15, 1984.
R. Iscoff, "Wafer Defect Detection System," Semiconductor International, Nov. 1982, pp. 39-52.

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