Unit magnification projection lens system

Details Unit magnification projection lens system Unit magnification projection lens system

1996-02-22

1997-12-09

Nelms, David C.

Optical: systems and elements

Lens

With field curvature shaping

359663, G02B 300, G02B 1322

Patent

active

056966318

ABSTRACT:
A unit magnification lens system suitable for imaging of features in photoresist designed for exposure at a wavelength of 248.4 nm using a krypton fluoride excimer laser. This lens system is characterized by a very long working distance in the object and image spaces to allow incorporation of minors in the imaging path. The optical system is refractive, telecentric, and symmetrical about the central aperture stop.

REFERENCES:
patent: 4891663 (1990-01-01), Hirose
patent: 5388003 (1995-02-01), Naganuma et al.

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