Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1975-09-11
1977-04-19
Chatmon, Jr., Saxfield
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250504, F26B 330
Patent
active
040190625
ABSTRACT:
A system, designed to cure an ultraviolet sensitive coating on a substrate that is moving in a direction transverse to the radiation emitted from the system, which includes a plurality of arrays of short-arc ultraviolet lamps, each array located in a suitable housing. The arc of each lamp in a given array is located at the focus of an associated paraboloidal reflector mounted within the housing so that at least half of the ultraviolet radiation emanating from the arc is reflected by the paraboloidal reflector to produce a collimated beam of ultraviolet radiation directed toward a concave spherical reflector whose center is located axially with the paraboloidal reflector. As measured between the two reflectors, the axis of the spherical reflector normally forms a (45.degree.) angle with respect to the axis of the paraboloidal reflector to reflect the collimated beam toward the substrate. Because of the concave surface of the spherical reflector, the radiant energy is focused to a small area on the substrate. This area is adjustable over a wide range depending on the focal lengths of the spherical and paraboloidal reflectors which are chosen so as to arrive at the most desirable intensity of radiation for the particular sensitivity of the coating being treated. Each array produces a set of disconnected high intensity image areas on the substrate, with the totality of arrays providing complete coverage across the width of the substrate. Within each array, the spherical reflectors are mounted to an assembly within the housing for pivotal movement into a position to reflect the focused beam 180.degree. from its normal direction so that no energy strikes the substrate when it is not in motion.
REFERENCES:
patent: 3224330 (1965-12-01), Kompfner
patent: 3453425 (1969-07-01), Whitaker
patent: 3621198 (1971-11-01), Herbrich
patent: 3829982 (1974-08-01), Prey et al.
Anderson B. C.
Chatmon, Jr. Saxfield
LandOfFree
Unit for treatment of substrate with ultraviolet radiation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Unit for treatment of substrate with ultraviolet radiation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Unit for treatment of substrate with ultraviolet radiation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-105210