Radiation imagery chemistry: process – composition – or product th – Nonradiation sensitive image processing compositions or... – Process of preparing composition from plural preformed...
Patent
1998-03-26
1999-07-13
Le, Hoa Van
Radiation imagery chemistry: process, composition, or product th
Nonradiation sensitive image processing compositions or...
Process of preparing composition from plural preformed...
G03C 538
Patent
active
059225211
ABSTRACT:
A powdered, uniformly mixed photographic processing composition is prepared with intense mixing of dry photoprocessing chemical components, and by forming uniformly sized agglomerates of the mixed powder. During agglomeration, a solution of a binder material is applied in a controlled manner to enable the mixed powder particles to stick together but without leaving much residue in the final composition. With this process, the mixed powder and agglomerates each have desired uniformity in size and chemical composition. The resulting dry uniformly mixed composition is highly stable, dissolvable and substantially free of dust.
REFERENCES:
patent: 3867151 (1975-02-01), Katz
patent: 3981732 (1976-09-01), Emoto et al.
patent: 4029510 (1977-06-01), Speers
patent: 4414307 (1983-11-01), Kapecki et al.
patent: 4546069 (1985-10-01), Libicky et al.
patent: 4753869 (1988-06-01), Long et al.
patent: 4816384 (1989-03-01), Fruge et al.
patent: 4917992 (1990-04-01), Tirel et al.
patent: 4923786 (1990-05-01), Kuhnert et al.
Brayer Franklin C.
Gamble William J.
Gurney Walter T.
Eastman Kodak Company
Le Hoa Van
Tucker J. Lanny
LandOfFree
Uniformly mixed dry photographic processing composition and meth does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Uniformly mixed dry photographic processing composition and meth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Uniformly mixed dry photographic processing composition and meth will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2274864