Uniformly cooled plasma etching electrode

Electric heating – Metal heating – By arc

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

219121PG, 219121PF, 219121PR, 156643, 165154, 165169, B23K 900

Patent

active

043617492

ABSTRACT:
A planar electrode (17) having a plurality of concentric channels (34-34) therein through which coolant fluid passes to cool the electrode during a plasma etching process. The coolant is directed through at least two of the adjacent channels in opposite directions with the inputs (31) and outputs (32) located in close spaced relation to one another to provide a substantially uniform temperature on the surface of the electrode proximate thereto.

REFERENCES:
patent: 3293868 (1966-12-01), Gonzalez
patent: 3307619 (1967-03-01), Dae Sik Kim
patent: 3598710 (1971-08-01), Davidse
patent: 3664942 (1972-05-01), Havas et al.
patent: 3757733 (1973-09-01), Reinberg
patent: 3907028 (1975-09-01), Lawson
patent: 3984301 (1976-10-01), Matsuzaki et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Uniformly cooled plasma etching electrode does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Uniformly cooled plasma etching electrode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Uniformly cooled plasma etching electrode will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-197056

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.