Uniform plasma for drill smear removal reactor

Details Uniform plasma for drill smear removal reactor Uniform plasma for drill smear removal reactor

1985-01-17

1986-10-21

Terapane, John F.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

42218604, 42218605, 204298, 156345, B01J 1908, B01J 1912, C23F 102

Patent

active

046184775

ABSTRACT:
A system for generating a substantially uniform plasma for processing a substrate having two major surfaces. Each of the substrate major surfaces may have electrically conductive portions. Two electrodes are oppositely disposed with respect to one another on either side of the substrate. A first r.f. power source is electrically connected to the first electrode and a second r.f. power source is electrically connected to the second electrode. The first and second r.f. power sources are out of phase with respect to one another, resulting in the generation of a substantially uniform plasma field.

REFERENCES:
patent: 3461054 (1969-08-01), Vratny
patent: 3485735 (1969-12-01), Manion
patent: 3600126 (1971-08-01), Hellund
patent: 3702258 (1972-11-01), Gibbons
patent: 3860507 (1975-01-01), Vessen, Jr.
patent: 4013532 (1977-03-01), Cormia
patent: 4233109 (1980-11-01), Nishizawa
patent: 4264813 (1981-04-01), Chandrashekhar et al.
patent: 4285800 (1981-08-01), Welty
patent: 4292153 (1981-09-01), Kudo

Affiliated with

Also associated with

Rating

Uniform plasma for drill smear removal reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Uniform plasma for drill smear removal reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Uniform plasma for drill smear removal reactor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1289038