Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1986-04-11
1988-01-26
Chatmon, Saxfield
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
315344, 31511141, 31323131, 313161, 250423R, 376144, 376107, H01J 724, H01J 2700, H05H 704
Patent
active
047218894
ABSTRACT:
An applied-B field extraction ion diode has uniform insulation over an anode surface for increased efficiency. When the uniform insulation is accomplished with anode coils, and a charge-exchange foil is properly placed, the ions may be focused at a point on the z axis.
REFERENCES:
patent: 4507589 (1985-03-01), Prono
D. Johnson et al., "Anode Plasma Behavior in a Magnetically Insulated Ion Diode", J. Appl. Phys., 52(1), Jan. 81, pp. 168-174.
D. Johnson et al., "Electron and Ion Kinetics and Anode Plasma Formation in Two Applied-B Ion Diodes," J. Appl. Phys., 57(1), Feb. 85, pp. 794-805.
P. Dreike et al., "Selective Focusing of Different Ion Species Produced by Magnetically Insulated Ion Beam Diodes," J. Appl. Phys., 57(5), Mar. 85, pp. 1589-1591.
Seidel David B.
Slutz Stephen A.
Chafin James H.
Chatmon Saxfield
Hightower Judson R.
Libman George H.
Powell Mark R.
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