Uniform gas distributor to a wafer

Details Uniform gas distributor to a wafer Uniform gas distributor to a wafer

1990-08-23

1992-12-29

Beck, Shrive

Coating apparatus

Gas or vapor deposition

118728, 2395903, C23C 1600

Patent

active

051748258

ABSTRACT:
A gas distribution system 140 includes a gas distribution chamber 142 and a gas distributor 154. Gas distribution chamber 142 includes an open end 144 and a closed end 146. A workpiece 148 is disposed adjacent closed end 146. Gas distributor 154 includes an outer collar 156 and an inner collar 158. Inner collar 158 has a continuously increasing cross-sectional diameter from a first predetermined point 160 to a second predetermined point 162. Gases are introduced through an inlet tube 150 disposed through an aperture in a platform 152 into the interior of inner collar 158 and toward workpiece 148. A diverter 164 diverts incoming gases from inlet tube 150.

REFERENCES:
patent: 3996025 (1976-12-01), Gulden
patent: 4825809 (1989-05-01), Mieno

Affiliated with

Also associated with

Rating

Uniform gas distributor to a wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Uniform gas distributor to a wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Uniform gas distributor to a wafer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1884460