Uniform gas cushion wafer support

Details Uniform gas cushion wafer support Uniform gas cushion wafer support

2006-07-04

2006-07-04

Kackar, Ram N (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S728000, C118S724000, C156S345510, C156S345520, C219S444100, C219S544000, C204S192100, C204S298010

Reexamination Certificate

active

07070661

ABSTRACT:
A workpiece is supported on a gas cushion to reduce mechanical stresses on the workpiece during processing. A plenum having a workpiece support flange for receiving the workpiece is connected to a gas supply. When gas flows into the plenum and pressure increases sufficiently to lift the workpiece, the workpiece is lifted and the gas flows out of the plenum between the flange and the workpiece edge. The workpiece is thus supported above the flange by the gas during processing.

REFERENCES:
patent: 4857689 (1989-08-01), Lee
patent: 4952299 (1990-08-01), Chrisos et al.
patent: 5900177 (1999-05-01), Lecouras et al.
patent: 6183565 (2001-02-01), Granneman et al.
patent: 6408767 (2002-06-01), Binnard et al.
patent: 2003/0178145 (2003-09-01), Anderson et al.
patent: 2002190715 (2002-07-01), None
patent: WO 2002101806 (2002-12-01), None

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