Uniform exposure of positive-acting diazo type materials through

Details Uniform exposure of positive-acting diazo type materials through Uniform exposure of positive-acting diazo type materials through

1978-10-31

1981-02-10

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

430326, 430327, 430394, 430494, G03C 158, G03C 522

Patent

active

042502420

ABSTRACT:
This invention relates to an improvement in a material adapted for imagewise exposure to actinic light comprising a transparent or translucent support having a positive-acting quinone diazide light-sensitive coating composition in direct contact with one surface thereof, the improvement comprising that the surface of said coating in direct contact with said support is substantially photodecomposed, and that a gradient exists in said coating wherein the percentage of undecomposed light-sensitive quinone diazide increases with increasing distance from said support. The invention also relates to a method for preparing the novel material.

REFERENCES:
patent: 3005708 (1961-10-01), Hesse
patent: 3032414 (1962-05-01), James et al.
patent: 3241973 (1966-03-01), Thommes
patent: 3259499 (1966-07-01), Thommes
patent: 3313626 (1967-04-01), Whitney
patent: 3355295 (1967-11-01), Priest
patent: 3635711 (1969-06-01), Miller et al.
patent: 3759711 (1973-09-01), Rauner et al.

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