Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate
2005-05-10
2005-05-10
Alanko, Anita (Department: 1765)
Etching a substrate: processes
Forming or treating an article whose final configuration has...
C216S024000, C216S041000, C216S051000
Reexamination Certificate
active
06890446
ABSTRACT:
A method for making an emitter for a display device, an emitter array produced by such method, an etch mask used during such method, and a method for making such an etch mask are disclosed. The method for making the emitter comprises providing a substrate, forming a conducting layer on the substrate, forming an emitting layer on the conducting layer, forming an etch mask having a controlled distribution of a plurality of mask sizes over the emitting layer, and forming at least one emitter by removing portions of the emitting layer using the etch mask. The method for making the etch mask comprises forming an etch mask layer over an emitting layer, forming a patterning layer having a controlled distribution of mask sizes over the etch mask layer, and forming the etch mask by removing portions of the etch mask layer using the controlled distribution of mask sizes in the patterning layer. In both methods, the controlled distribution of mask sizes preferably contains one mask size which is a median mask size with an equal number of larger and smaller mask sizes, where every larger mask size has a corresponding smaller mask size, the average of the smaller and larger mask sizes being the median mask size.
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Alanko Anita
Micro)n Technology, Inc.
TraskBritt PC
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