Uniform deep ultraviolet radiant source for sub micron resolutio

Photocopying – Projection printing and copying cameras – Illumination systems or details

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Details

G03B 2754

Patent

active

049070290

ABSTRACT:
An optical system is provided for forming an effective image source of DUV radiation which is characterized by symmetry, high uniformity of ray bundle distribution, high spatial stability and high brightness. The system utilizes an elongated medium/low pressure mercury lamp which is surrounded by a large lightly diffused ellipsoidal reflector. The elongated medium/low pressure mercury source is converted by the lightly diffused ellipsoidal reflector into a large circular radiant source which becomes the effective object source of a condenser lens system. The effective object source of the ellipsoidal reflector is projected through a small diameter condenser lens system where it is reduced between six to ten times to an effective image source. The system then projects the symmetrical and spatially stable image source at the condenser conjugate to a lens system of two plano convex lenses to convert this uniform and spatially stable effective image source into a collimated beam for contact or proximity printing of DUV photoresist coated silicon or gallium arsenide wafers. A DUV objective can also be used for projection exposure on wafer steppers.

REFERENCES:
patent: 3316804 (1967-05-01), Weisglass
patent: 3596083 (1971-07-01), Lovering
patent: 3689760 (1972-09-01), Stewart
patent: 4682885 (1987-07-01), Torigoe
patent: 4789222 (1988-12-01), Ota et al.

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