Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-07-10
1994-03-01
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419212, C23C 1434
Patent
active
052904164
ABSTRACT:
An apparatus for depositing magnetic material on a substrate uses a magnet assembly formed of permanent magnet pieces that provide a uniaxial magnetic field. The magnet assembly is preferably made from ceramic magnetic tiles that are joined to form an arcuate strip. The permanent magnet strip is located external to the deposition chamber and positioned so that the magnetic flux lines traverse a workpiece or wafer seated within the chamber.
REFERENCES:
patent: 5045166 (1991-09-01), Bobbio
Newman John J.
Tong Hua-Ching
Wu Hon-Sian J.
Kallman Nathan N.
Read-Rite Corporation
Weisstuch Aaron
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