Undercoating material for photosensitive resins

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate

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Details

525504, 528162, 528163, 430160, 430166, 430167, 430271, C08G 816, C14G 1410, G03C 176

Patent

active

049027700

ABSTRACT:
The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.

REFERENCES:
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patent: 4238560 (1980-12-01), Nakamura et al.
patent: 4268603 (1981-05-01), Sato
patent: 4287289 (1981-09-01), Sato
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4414314 (1983-11-01), Kaplan et al.
patent: 4450215 (1984-05-01), Reithel et al.
patent: 4737438 (1988-04-01), Ito et al.

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