Stock material or miscellaneous articles – Composite – Of quartz or glass
Reexamination Certificate
2011-08-16
2011-08-16
Speer, Timothy M (Department: 1784)
Stock material or miscellaneous articles
Composite
Of quartz or glass
C428S469000, C428S697000, C428S701000, C428S702000
Reexamination Certificate
active
07998586
ABSTRACT:
A coated article includes a substrate and a first coating formed over at least a portion of the substrate. The first coating includes a mixture of oxides including oxides of at least two of P, Si, Ti, Al and Zr. A functional coating is formed over at least a portion of the first coating. In one embodiment, the functional coating includes fluorine doped tin oxide. In another embodiment, the functional coating includes titania.
REFERENCES:
patent: 4746347 (1988-05-01), Sensi
patent: 4792536 (1988-12-01), Pecoraro et al.
patent: 4853257 (1989-08-01), Henery
patent: 4971843 (1990-11-01), Michelotti et al.
patent: 5030593 (1991-07-01), Heithoff
patent: 5030594 (1991-07-01), Heithoff
patent: 5240886 (1993-08-01), Gulotta et al.
patent: 5385872 (1995-01-01), Gulotta et al.
patent: 5393593 (1995-02-01), Gulotta et al.
patent: 5395698 (1995-03-01), Neuman et al.
patent: 5464657 (1995-11-01), Athey et al.
patent: 5536718 (1996-07-01), Albright et al.
patent: 5599387 (1997-02-01), Neuman et al.
patent: 5714199 (1998-02-01), Gerhardinger et al.
patent: 6027766 (2000-02-01), Greenberg et al.
patent: 2004/0180218 (2004-09-01), Nagashima et al.
patent: 2004/0202890 (2004-10-01), Kutilek et al.
patent: 2006/0029813 (2006-02-01), Kutilek et al.
patent: 2007/0184291 (2007-08-01), Harris et al.
patent: 0 927 706 (1999-07-01), None
patent: 1 056 136 (2000-11-01), None
patent: 2005066286 (2005-07-01), None
“Chemical vapor deposition of Al2O3films using highly volatile single sources”; Wonyong Koh, Su-Jin Ku, Yunsoo Kim; Thin Solid Films 304 (1997) 222-224.
“Al2O3thin films from aluminum dimethyl-isopropoxide by metal-organic chemical vapor deposition”; Davide Barreca, Giovanni A. Battiston, Rosalba Gerbasi and Eugenio Tondello; J. Mater. Chem. 10 (2000) 2127-2130.
“Low temperature chemical vapor deposition of aluminosilicate thin films on carbon fibers,” Vernal N. Richards, Jason K. Vohs and Bradley D. Fahlman; J. Am. Ceram. Soc. 88 [7] 1973-1976 (2005).
Sodium passivation dependence on phosphorus concentration in tetraethylorthosilicate plasma-enhanced chemical vapor deposited phosphosilicate glasses, J. Kalpathy Cramer, S.P. Murakara, K. V. Srikrishnan, W. Patrick, J. Appl. Phys., 73(5), Mar. 1, 1993, pp. 2458-2461.
R. C. Smith, N. Hoilien, C. Dykstra, S. A. Campbell, J. T. Roberts, and W. L. Gladfelter, “CVD of TixSi1-xO2 films: Precursor chemistry impacts films composition,” Chemical Vapor Deposition, 9 (2) (2003) 79-86.
PCT International Search Report, PCT/US2009/064292 dated Feb. 15, 2010.
Arbab Mehran
Boykin Cheri M.
Harris Caroline S.
Koltover Ilya
Lu Songwei
PPG Industries Ohio Inc.
Robinson Lauren
Siminerio Andrew C.
Speer Timothy M
LandOfFree
Undercoating layers providing improved topcoat functionality does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Undercoating layers providing improved topcoat functionality, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Undercoating layers providing improved topcoat functionality will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2722044