Undercoating composition for photolithography

Details Undercoating composition for photolithography Undercoating composition for photolithography

1998-02-05

1999-06-01

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

430156, 430166, 4302711, G03C 1825

Patent

active

059087382

ABSTRACT:
Proposed is a novel undercoating composition used in the photolithographic patterning of a photoresist layer by intervening between the substrate surface and the photoresist layer to decrease the adverse influences of the reflecting light from the substrate surface. The undercoating composition of the invention comprises (a) a melamine compound substituted by methylol groups and/or alkoxymethyl groups and (b) a polyhydroxy benzophenone compound, diphenyl sulfone compound or diphenyl sulfoxide compound, optionally, with admixture of (c) an alkali-insoluble resin of a (meth)acrylic acid ester.

REFERENCES:
patent: 4889789 (1989-12-01), Stahlofen
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5008175 (1991-04-01), Hsieh et al.
patent: 5077173 (1991-12-01), Schultz et al.
patent: 5089373 (1992-02-01), Uenishi et al.
patent: 5234990 (1993-08-01), Flaim et al.
patent: 5294680 (1994-03-01), Knors et al.
patent: 5728508 (1998-03-01), Takemura et al.
patent: 5736301 (1998-04-01), Fahey et al.
patent: 5744293 (1998-04-01), Okumura et al.
patent: 5783361 (1998-07-01), Conley et al.

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