Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Reexamination Certificate
2008-11-24
2011-10-25
Le, Hoa (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
C428S331000
Reexamination Certificate
active
08043774
ABSTRACT:
The presently disclosed embodiments are directed to layers that are useful in imaging apparatus members and components, for use in electrostatographic, including digital, apparatuses. More particularly, the present embodiments provide a robust undercoat layer comprising TiSi in which the TiO2to SiO2ratio falls in a particular ratio range discovered to reduce both plywood print defects as well as abnormal operating parameters and print defects from micro-cracks in the undercoat layer, and methods for making the same.
REFERENCES:
patent: 4265990 (1981-05-01), Stolka et al.
patent: 4286033 (1981-08-01), Neyhart et al.
patent: 4291110 (1981-09-01), Lee
patent: 4333387 (1982-06-01), Seitz
patent: 4464450 (1984-08-01), Teuscher
patent: 4664995 (1987-05-01), Horgan et al.
patent: 4921769 (1990-05-01), Yuh et al.
patent: 4921773 (1990-05-01), Melnyk et al.
patent: 5215839 (1993-06-01), Yu
patent: 5660961 (1997-08-01), Yu
patent: 5853906 (1998-12-01), Hsieh
patent: 5958638 (1999-09-01), Katayama et al.
patent: 6156468 (2000-12-01), Wehelie et al.
patent: 6858363 (2005-02-01), Belknap et al.
patent: 7419752 (2008-09-01), Wu et al.
patent: 7732111 (2010-06-01), Wu et al.
patent: 2004/0197686 (2004-10-01), Belknap et al.
patent: 2004/0202947 (2004-10-01), Wu et al.
patent: 2005/0233231 (2005-10-01), Qi et al.
patent: 2005/0233235 (2005-10-01), Qi et al.
patent: 2007/0059620 (2007-03-01), Tong et al.
patent: 2007/0092815 (2007-04-01), Wu et al.
Evans Kent J.
Kilis Richardson H.
Lin Ma
Ramos Adilson P.
Thomas Mark S.
Le Hoa
Pillsbury Winthrop Shaw & Pittman LLP
Xerox Corporation
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