Compositions – Compositions containing a single chemical reactant or plural... – Inorganic reactant other than sulfur containing
Patent
1989-02-16
1990-04-24
Thexton, Matthew A.
Compositions
Compositions containing a single chemical reactant or plural...
Inorganic reactant other than sulfur containing
208 48AA, 208 52CT, 502 22, 502168, 556 76, 556 80, C10G 1100
Patent
active
049198408
ABSTRACT:
Unclouded solutions of antimony hydrocarbylthiolate suitable for metals passivation are produced utilizing an amine. In one embodiment of the invention the amine is included with the antimony oxide and hydroxyhydrocarbylthiol reactants to produce the passivating agent. In another embodiment of the invention, the metals passivation additive is produced by combining antimony oxide with a hydroxyhydrocarbylthiol to produce a reaction mixture which is thereafter contacted with an amine. The resulting product is useful for the passivation of metals deposited on cracking catalysts.
REFERENCES:
patent: 2684956 (1954-07-01), Weinberg et al.
patent: 3347821 (1967-10-01), Malz et al.
patent: 3359218 (1967-12-01), Wiles
patent: 4025458 (1977-05-01), McKay
patent: 4190552 (1980-02-01), Bertus et al.
patent: 4321129 (1982-03-01), Bertus et al.
patent: 4336168 (1982-06-01), Hoch et al.
patent: 4460511 (1984-07-01), Boston
patent: 4495064 (1985-01-01), Boston
patent: 4507398 (1985-03-01), Boston
patent: 4535066 (1985-08-01), Mark et al.
patent: 4551231 (1985-11-01), Kovach et al.
patent: 4595771 (1986-06-01), Blaschke et al.
patent: 4595772 (1986-06-01), Blaschke et al.
patent: 4830730 (1989-05-01), Boston
Brandes K. K.
Phillips Petroleum Company
Thexton Matthew A.
LandOfFree
Unclouded metals passivation additive does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Unclouded metals passivation additive, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Unclouded metals passivation additive will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-33073