Chemistry of inorganic compounds – Carbon or compound thereof – Elemental carbon
Patent
1993-03-26
1994-09-13
Warden, Robert J.
Chemistry of inorganic compounds
Carbon or compound thereof
Elemental carbon
422312, 423460, 423DIG39, 423DIG40, D01F 912
Patent
active
053466837
ABSTRACT:
Uncapped and thinned carbon nanotubes are produced by reaction with a flowing reactant gas capable of reaction selectively with carbon atoms in the capped region of nanotubes. The uncapped and thinned nanotubes provide open compartments for insertion of chemicals and exhibit enhanced surface area with modified physical and chemical properties.
REFERENCES:
patent: 5094906 (1992-03-01), Witzke et al.
Ajayan et al, "Opening carbon nanotubes with oxygen and implications for filling", Nature, vol. 362, Apr. 8, 1993, pp. 522-525.
Tsang et al., "Thinning and opening carbon nanotubes by oxidation using carbon dioxide", Nature, vol. 362, Apr. 8, 1993, pp. 520-522.
S. Iijima, "Helical Microtubules of Graphitic Carbon," Nature, vol. 354, pp. 56-58 (1991).
W. Kratschmer, L. Lamb, K. Fostiropoulos & D. Huffman, "Solid C.sub.60 : A New Form of Carbon," Nature, vol. 347, pp. 354-358 (1990).
T. Ebbesen & P. Ajayan, "Large-scale Synthesis of Carbon Nanotubes," Nature, vol. 358, pp. 220-221 (1992).
P. Ajayan & S. Iijima, "Capillarity-induced Filling of Carbon Nanotubes," Nature, vol. 361, pp. 333-334 (1993).
S. Iijima, T. Ichihashi & Y. Ando, "Pentagons, Heptagons and Negative Curvative in Graphite Microtubule Growth," Nature, vol. 356, pp. 776-778 (1992).
Green Malcolm L. H.
Tsang Shik C.
Gas Research Institute
Thornton Krisanne M.
Warden Robert J.
LandOfFree
Uncapped and thinned carbon nanotubes and process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Uncapped and thinned carbon nanotubes and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Uncapped and thinned carbon nanotubes and process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1118806