Chemical apparatus and process disinfecting – deodorizing – preser – Process disinfecting – preserving – deodorizing – or sterilizing – Using direct contact with electrical or electromagnetic...
Patent
1997-10-31
2000-08-08
McKane, Elizabeth
Chemical apparatus and process disinfecting, deodorizing, preser
Process disinfecting, preserving, deodorizing, or sterilizing
Using direct contact with electrical or electromagnetic...
134 1, 428543, 428913, A61L 210, B08B 700, B32B 900
Patent
active
060997982
ABSTRACT:
Nanoscale UV absorbing particles are described that have high UV absorption cross sections while being effectively transparent to visible light. These particles can be used to shield individuals from harmful ultraviolet radiation. These particles can also be used in industrial processing especially to produce solid state electronic devices by creating edges of photoresist material with a high aspect ratio. The UV absorbing particles can also be used as photocatalysts that become strong oxidizing agents upon exposure to UV light. Laser pyrolysis provides an efficient method for the production of suitable particles.
REFERENCES:
patent: 3566855 (1971-03-01), Morgan
patent: 3658539 (1972-04-01), Dantro
patent: 3709984 (1973-01-01), Dantro
patent: 3923968 (1975-12-01), Basque et al.
patent: 4241042 (1980-12-01), Matijevic et al.
patent: 4548798 (1985-10-01), Rice
patent: 4558017 (1985-12-01), Gupta et al.
patent: 4574078 (1986-03-01), Cortesi et al.
patent: 4687753 (1987-08-01), Fiato et al.
patent: 4842832 (1989-06-01), Inoue et al.
patent: 5013706 (1991-05-01), Schramm et al.
patent: 5035784 (1991-07-01), Anderson et al.
patent: 5053580 (1991-10-01), Schramm et al.
patent: 5061473 (1991-10-01), De Cleyn et al.
patent: 5108732 (1992-04-01), Krumbe et al.
patent: 5443811 (1995-08-01), Karvinen
patent: 5449467 (1995-09-01), Taoda et al.
patent: 5536448 (1996-07-01), Takahashi et al.
patent: 5712461 (1998-01-01), Zhang et al.
Bi et al., J. Mater. Res., vol. 8, No. 7, pp. 1666-1674 (Jul. 1993).
Curcio et al., Applied Surface Science, vol. 46, pp. 225-229 (1990).
Musci et al., J. Mater. Res., vol. 7, No. 10, pp. 2846-2852 (Oct. 1992).
Rice et al., J. Am. Ceram. Soc., vol. 71, No. 4, pp. C-181-C-183 (1988).
Siegel et al., J. Mater. Res., vol. 3, No. 6, pp. 1367-1372 (Nov./Dec. 1988).
Bi Xiangxin
Kambe Nobuyuki
Dardi Peter S.
McKane Elizabeth
NanoGram Corp.
LandOfFree
Ultraviolet light block and photocatalytic materials does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ultraviolet light block and photocatalytic materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultraviolet light block and photocatalytic materials will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1147454