Ultraviolet laser apparatus and semiconductor exposure apparatus

Coherent light generators – Particular resonant cavity – Plural cavities

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

372 21, 372 5, 372 22, H01S 3082

Patent

active

060883790

ABSTRACT:
An ultraviolet laser apparatus which generates laser light at 193 nm to 213 nm with high temporal and spatial coherence and relatively high power is disclosed. The UV laser apparatus provides a light source for an exposure device for optical lithography and an aberration measurement interferometer that measures lens wave front aberration. The laser apparatus disclosed herein comprises two lasers having laser resonators that are coincident along a portion of their respective optical paths. A nonlinear optical crystal is located along the shared optical path portion for sum frequency generation of the light of the respective lasers.

REFERENCES:
patent: 5307358 (1994-04-01), Scheps
patent: 5333142 (1994-07-01), Scheps
patent: 5388113 (1995-02-01), Oka
patent: 5408481 (1995-04-01), Scheps
patent: 5552926 (1996-09-01), Owa et al.
patent: 5699372 (1997-12-01), Okazaki
patent: 5764662 (1998-06-01), Pinto
patent: 5832009 (1998-11-01), Kikuchi
Kaneda and Kubota, CW 355 nm Generation by Doubly-Resonant Sum-Frequency Mixing in an External Resonator, Optical Society of America, TOPS on Advanced Solid-State Lasers, vol. 1, 1996.
Berkeland, Cruz, and Bergquist, Sum-frequency generation of continuous-wave light at 194, nm, Applied Optics, vol. 36, No. 18, 1997.
Liu, Dunning, and Tittel, Intracavity sum frequency mixing as a source of tunable cw uv radiation, Optical Society of America, Applied Optics, vol. 21, No. 19, 1982.
Watanabe, Hayasaka, Imajo and Urabe, Continuous-wave sum-frequency generation near 194nm in B-BaB204 crystals with an enhancement cavity, Optical Society of America, Optics Letters, vol. 17, No. 1, 1992.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ultraviolet laser apparatus and semiconductor exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ultraviolet laser apparatus and semiconductor exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultraviolet laser apparatus and semiconductor exposure apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-549501

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.