Ultraviolet-curable resin material for pattern transfer and...

Details Ultraviolet-curable resin material for pattern transfer and... Ultraviolet-curable resin material for pattern transfer and...

2010-03-11

2011-12-06

Tran, Binh X (Department: 1713)

Etching a substrate: processes

Forming or treating article containing magnetically...

C216S040000, C216S054000, C216S058000, C428S800000, C522S006000

Reexamination Certificate

active

08070968

ABSTRACT:
According to one embodiment, this invention uses an ultraviolet-curable resin material for pattern transfer containing 80 to 95 wt % of isobornyl acrylate, 1 to 20 wt % of trifunctional acrylate, and 0.5 to 6 wt % of a polymerization initiator.

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Information Sheet in 2 pages.
Notification of Reasons of Rejection mailed by Japan Patent Office on Mar. 19, 2011 in the corresponding Japanese patent application No. 2010-265030 in 7 pages.
Notification of Reasons of Rejection mailed by Japan Patent Office on Jan. 11, 2011 in the corresponding Japanese patent application No. 2009-066643 in 4 pages.
Notification of Decision of Rejection mailed by Japan Patent Office on Aug. 31, 2010 in the corresponding Japanese patent application No. 2009-066643 in 4 pages.
Notification of Reasons of Rejection mailed by Japan Patent Office on May 25, 2010 in the corresponding Japanese patent application No. 2009-066643 in 6 pages.

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