Ultraviolet absorber precursor compound, photosensitive resin co

Details Ultraviolet absorber precursor compound, photosensitive resin co Ultraviolet absorber precursor compound, photosensitive resin co

1996-07-08

1998-05-12

Martin, Roland

Radiation imagery chemistry: process, composition, or product th

Imaged product

Multilayer

430 17, 430 18, 430350, 4302701, 430512, 522 78, 544180, G03C 300, C07D25100

Patent

active

057502927

ABSTRACT:
A compound represented by the following general formula (1) and a photosensitive resin composition comprising the compound of formula (1): ##STR1## The compound of formula (1) normally has a low ultraviolet absorption, but has a high ultraviolet absorption when heat-treated. The present invention also provides a photosensitive resin layer composition which has a low ultraviolet absorption in an appropriate wavelength range such that ultraviolet rays reach sufficiently deep into the film to effect curing when exposed to light, but which has a high ultraviolet absorption when subsequently processed.

REFERENCES:
patent: 2714057 (1955-07-01), Chenicek
patent: 3203550 (1965-08-01), Schaefer
patent: 3294798 (1966-12-01), Schaefer
patent: 3344137 (1967-09-01), Bader
patent: 4963160 (1990-10-01), Hung et al.
patent: 5084372 (1992-01-01), Hsieh et al.
patent: 5098445 (1992-03-01), Hung et al.
patent: 5538840 (1996-07-01), Toan et al.
patent: 5647668 (1997-07-01), Hagemann et al.

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