Abrading – Machine – Combined
Reexamination Certificate
2005-06-21
2005-06-21
Wilson, Lee D. (Department: 3723)
Abrading
Machine
Combined
C451S056000, C451S285000, C451S444000
Reexamination Certificate
active
06908371
ABSTRACT:
A method and system for cleaning conditioning devices used in chemical mechanical polishing (CMP) systems is disclosed. The system includes a robotic arm for holding and transporting the conditioning device between the polish pad area of the machine and the conditioning device cleaning area. The cleaning area consists of an ultrasonic tank containing a liquid for the purpose of removing particles, residues and contaminants from the conditioning device and its mounting hardware. Removal of contaminants from the conditioning device leads to reduced defect levels in the CMP process.
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Honeywell International , Inc.
Schiff & Hardin LLP
Wilson Lee D.
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