Ultrasonic cleaning apparatus

Details Ultrasonic cleaning apparatus Ultrasonic cleaning apparatus

1998-05-26

2000-02-22

Gulakowski, Randy

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

134902, 134 1, B08B 300

Patent

active

060268328

ABSTRACT:
The invention provides an ultrasonic cleaning apparatus capable of radiating ultrasonic waves effectively over the entire cleaning face of a wafer and thus having an improved cleaning effect. Supporting members 28a, 28b for holding wafers 7 in a fixed attitude in a cleaning liquid 6 are disposed at different heights, and ultrasonic wave protection plates 24a, 24b are respectively provided in front of ultrasonic wave generators 23a, 23b mounted on opposite walls of an ultrasonic wave tank 2 and are each movable between a position in front of the respective ultrasonic wave generator and a standby position retracted from in front of that ultrasonic wave generator. Each of the ultrasonic wave protection plates 24a, 24b is moved into position in front of its respective ultrasonic wave generator when ultrasonic waves are being radiated from the other side. The ultrasonic wave generators 23a, 23b are operated alternately, and an ultrasonic wave shadow region 29a (29b) in the shadow of a supporting member 28a (28b) when ultrasonic waves are being radiated from one side is subsequently irradiated with ultrasonic waves from the other side so that ultrasonic waves are radiated over the entire area of the cleaning face 7a of each wafer 7.

REFERENCES:
patent: 4543130 (1985-09-01), Shwartzman
patent: 4858875 (1989-08-01), Nielsen
patent: 4902350 (1990-02-01), Steck
patent: 5113881 (1992-05-01), Lin et al.
patent: 5133376 (1992-07-01), Samarin et al.
patent: 5379785 (1995-01-01), Ohmori et al.
patent: 5672212 (1997-09-01), Manos

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