Ultrasonic agitation-assisted development of resist layer of...

Details Ultrasonic agitation-assisted development of resist layer of... Ultrasonic agitation-assisted development of resist layer of...

2006-04-18

2006-04-18

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Use of sound or nondigital compressive force

C430S296000, C430S322000, C430S325000, C430S326000, C430S331000, C430S942000, C430S945000, C134S001000, C134S001300

Reexamination Certificate

active

07029798

ABSTRACT:
A method of forming a topographical pattern in a surface of a resist layer, comprising sequential steps of:(a) providing a substrate having a surface;(b) forming a desired thickness resist material layer on the substrate surface;(c) subjecting selected areas of the surface of the resist layer to exposure to an energy beam to form therein a latent image of a desired topographical pattern to be formed therein;(d) contacting the surface of the resist layer with a liquid developing solution comprising a preselected solvent for developing the latent image into the desired topographical pattern while simultaneously supplying ultrasonic energy thereto, the combination of supplying the ultrasonic energy to the preselected solvent providing an increased developing interval and improved image contrast between the exposed and unexposed areas of the layer of resist material, relative to when the liquid developing solution does not comprise the preselected solvent and the ultrasonic energy is not supplied thereto.

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