Ultrafine-grain-copper-base sputter targets

Metal treatment – Stock – Copper base

Reexamination Certificate

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C148S433000, C148S434000, C148S435000, C148S436000, C428S211100, C204S298130, C156S922000

Reexamination Certificate

active

06896748

ABSTRACT:
The sputter target has a composition selected from the group consisting of high-purity copper and copper-base alloys. The sputter target's grain structure is at least about 99 percent recrystallized; and the sputter target's face has a grain orientation ratio of at least about 10 percent each of (111), (200), (220) and (311). In addition, the sputter target has a grain size of less than about 10 μm for improving sputter uniformity and reducing sputter target arcing.

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