Ultra-wide field eyepiece for microscopes

Optical: systems and elements – Lens – Eyepiece

Patent

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Details

359761, 359770, G02B 2504, G02B 960, G02B 962

Patent

active

052551210

ABSTRACT:
The invention provides an ultra-wide field eyepiece for microscopes, in which such off-axial aberrations as the curvature of field, astigmatism and coma are well-enough corrected at a field number as large, as 26.5, and in which the flatness of the image surface is degraded even when the entrance pupil position varies, and which comprises, in order from the entrance side, a first lens unit G1 of negative refracting power, a second lens unit G2 of positive refracting power, a third lens unit G3 of negative refracting power, a fourth lens unit G4 of positive refracting power and a fifth lens unit G5 of positive refracting power with the surface having a stronger curvature facing the entrance side, said third to fifth lens units being located in the rear of an intermediate image plane.

REFERENCES:
patent: 4720183 (1988-01-01), Dilworth
patent: 4747675 (1988-05-01), Nagler

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