Ultra thin silicon oxide and metal oxide films and a method for

Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427515, 427226, 427553, 264430, C08F 248

Patent

active

059620790

ABSTRACT:
Ultra thin organo-ceramic and metal oxide films are prepared under room temperature and atmospheric conditions by exposing .alpha., .omega.--functional siloxane oligomers and fatty acid metal soaps, respectively, to a combination of ultraviolet light (UV) and ozone (O.sub.3). The process includes the steps of preparing ultra thin .alpha., .omega.--functional polysiloxane and fatty acid metal soap films using, but not limited to, the Langmuir-Blodgett (LB) technique. The LB technique permits construction of molecular monolayer or multilayer films on a variety of substrates. By using carboxylic acid end groups on the siloxane oligomers, metal ions can be incorporated into the SiO.sub.x film after UV-ozone exposure. This technique can be used to make electronically, optically, and chemically important organo-ceramic and metal oxide films on temperature sensitive substrates.

REFERENCES:
patent: 4028080 (1977-06-01), Di Vita et al.
patent: 4028135 (1977-06-01), Vig et al.
patent: 4273851 (1981-06-01), Muzyczko et al.
patent: 4562141 (1985-12-01), Tieke
patent: 4728576 (1988-03-01), Gillberg-LaForce et al.
patent: 4753855 (1988-06-01), Haluska et al.
patent: 4756977 (1988-07-01), Haluska et al.
patent: 4780790 (1988-10-01), Takimoto et al.
patent: 4808653 (1989-02-01), Haluska et al.
patent: 4822697 (1989-04-01), Haluska et al.
patent: 5082686 (1992-01-01), Desorcie et al.
patent: 5091162 (1992-02-01), Frye et al.
patent: 5130162 (1992-07-01), Ogawa et al.
patent: 5318857 (1994-06-01), Haluska
patent: 5331020 (1994-07-01), Brown et al.
patent: 5336532 (1994-08-01), Haluska et al.
patent: 5358739 (1994-10-01), Baney et al.
patent: 5387480 (1995-02-01), Haluska et al.
patent: 5399441 (1995-03-01), Bearinger et al.
patent: 5661092 (1997-08-01), Koberstein et al.
A. Klumpp et al., Photoinduced Transformation of Polysiloxane Layers to SiO.sub.2, pp. 301-303, Applied Surface Science 43 (1989) no month.
O. Joubert, Ultraviolet induced transformation of polysiloxane films, pp. 6647-6651 May 1, 1991; J. Applied Phys. 59(9).
John R. Vig, UV/Ozone Cleaning of Surfaces, pp. 1-25; U.S. Army Electronics Technology & Devices Laboratory no date.
K. Fujino et al., Low Temperature and Atmosperic Pressure CVD Polysiloxane, OMCTS, and Ozone, J. Electrochem Soc. vol. 138, No. 12, Dec. 1991, pp. 3727-3732.
A. A. Kalachev et al., Low temperature plasma treatment of monomolecular Langmuir-Blodgett films, 1993,pp. 307-311; Thin Solid films 228 no month.
M. D. Nyman et al., T.sub.8 -Hydridospherosiloxanes: Novel Precursors for SiO.sub.2 Thin Films. 1. prescusor Characterization and Preliminary CVD, Aug. 12, 1993, pp. 1636-1640.
Toshiro Maruyama et al., Silicon dioxide thin films prepared by photochemical vapor deposition from silicon tetraacetate, Apr. 19, 1993, pp. 201-203; Thin Solid films 232.
C. L. Mirley et al., A Novel Method for the Preparation of Ultrathin Organoceramic Films From Langmuir-Blodgett Layers, pp. 1-12;May 1995.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ultra thin silicon oxide and metal oxide films and a method for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ultra thin silicon oxide and metal oxide films and a method for , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultra thin silicon oxide and metal oxide films and a method for will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1168972

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.