Ultra low residual reflection, low stress lens coating and...

Coating processes – Optical element produced – Transparent base

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S010000, C427S166000, C427S255700, C359S580000, C359S581000, C359S589000

Reexamination Certificate

active

06972136

ABSTRACT:
A method is provided for coating optical lenses and other optical articles with anti-reflection (AR) coatings. The lenses have low reflectivity, provide a substantially white light reflection and have a low stress AR coating and are ideally suited for optical lenses made using a molding procedure which provides a low stress lens substrate. In one aspect the method uses special coating compositions with one being a high index of refraction composition and the other being a low index of refraction composition. In another aspect a method is also disclosed using an optical monitor in conjunction with a conventional vapor deposition apparatus whereby an optical reference lens is used and a particular light frequency of reflected light is measured and this measurement is then used to determine when the desired optical coating is achieved. In a still further aspect the method also preferably calculates the optical thickness of each layer using a specific ratio of blue to green to red colors in the reflected light. The stress of the AR coating is also controlled by adjusting the optical thickness for each layer, if necessary, to minimize the difference in the tensile stresses and compressive stresses between low index/high index layers.

REFERENCES:
patent: 3185020 (1965-05-01), Thelen
patent: 3695910 (1972-10-01), Louderback et al.
patent: 3781090 (1973-12-01), Sumita
patent: 3829197 (1974-08-01), Thelen
patent: 3854796 (1974-12-01), Thelen
patent: 3892490 (1975-07-01), Uetsuki et al.
patent: 4387960 (1983-06-01), Tani
patent: 4609267 (1986-09-01), Deguchi et al.
patent: 4850660 (1989-07-01), Jones et al.
patent: 4921760 (1990-05-01), Tani et al.
patent: 5015523 (1991-05-01), Kawashima et al.
patent: 5026469 (1991-06-01), Kunkel et al.
patent: 5124019 (1992-06-01), Kunkel et al.
patent: 5170291 (1992-12-01), Szczyrbowski et al.
patent: 5216542 (1993-06-01), Szczyrbowski et al.
patent: 5414506 (1995-05-01), Saisho et al.
patent: 5425983 (1995-06-01), Propst et al.
patent: 5494743 (1996-02-01), Woodard et al.
patent: 5852513 (1998-12-01), McDole et al.
patent: 5944964 (1999-08-01), Solberg et al.
patent: 5952084 (1999-09-01), Anderson et al.
patent: 6248448 (2001-06-01), Lippey et al.
patent: 6250758 (2001-06-01), Yoshihara et al.
patent: 6274014 (2001-08-01), Matsumoto et al.
patent: 6287430 (2001-09-01), Matsumoto et al.
patent: 6297128 (2001-10-01), Kim et al.
patent: 6481369 (2002-11-01), Takahashi et al.
patent: 6503636 (2003-01-01), Le Masson et al.
patent: 2003/0133124 (2003-07-01), Takahashi et al.
patent: 63-121801 (1988-05-01), None
patent: 11-131240 (1999-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ultra low residual reflection, low stress lens coating and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ultra low residual reflection, low stress lens coating and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultra low residual reflection, low stress lens coating and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3511388

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.