Ultra low residual reflection, low stress lens coating

Details Ultra low residual reflection, low stress lens coating Ultra low residual reflection, low stress lens coating

2007-12-25

2007-12-25

Bashore, Alain L. (Department: 1762)

Coating processes

Optical element produced

Transparent base

C427S166000, C427S556000, C427S557000, C427S585000, C427S255700, C427S419400, C427S010000, C359S582000, C359S589000

Reexamination Certificate

active

11253514

ABSTRACT:
A method is provided for coating optical lenses and other optical articles with anti-reflection (AR) coatings. The lenses have low reflectivity, provide a substantially white light reflection and have a low stress AR coating and are ideally suited for optical lenses made using a molding procedure which provides a low stress lens substrate. In one aspect the method uses special coating compositions with one being a high index of refraction composition and the other being a low index of refraction composition. In another aspect a method is also disclosed using an optical monitor in conjunction with a conventional vapor deposition apparatus whereby an optical reference lens is used and a particular light frequency of reflected light is measured and this measurement is then used to determine when the desired optical coating is achieved. In a still further aspect the method also preferably calculates the optical thickness of each layer using a specific ratio of blue to green to red colors in the reflected light. The stress of the AR coating is also controlled by adjusting the optical thickness for each layer, if necessary, to minimize the difference in the tensile stresses and compressive stresses between low index/high index layers.

REFERENCES:
patent: 3185020 (1965-05-01), Thelen
patent: 3695910 (1972-10-01), Louderback et al.
patent: 3781090 (1973-12-01), Sumita
patent: 3829197 (1974-08-01), Thelen
patent: 3854796 (1974-12-01), Thelen
patent: 3892490 (1975-07-01), Uetsuki et al.
patent: 4387960 (1983-06-01), Tani
patent: 4609267 (1986-09-01), Deguchi et al.
patent: 4850660 (1989-07-01), Jones et al.
patent: 4921760 (1990-05-01), Tani et al.
patent: 5015523 (1991-05-01), Kawashima et al.
patent: 5026469 (1991-06-01), Kunkel et al.
patent: 5124019 (1992-06-01), Kunkel et al.
patent: 5170291 (1992-12-01), Szczyrbowski et al.
patent: 5216542 (1993-06-01), Szczyrbowski et al.
patent: 5414506 (1995-05-01), Saisho et al.
patent: 5425983 (1995-06-01), Propst et al.
patent: 5494743 (1996-02-01), Woodard et al.
patent: 5852513 (1998-12-01), McDole et al.
patent: 5944964 (1999-08-01), Solberg et al.
patent: 5952084 (1999-09-01), Anderson et al.
patent: 6248448 (2001-06-01), Lippey et al.
patent: 6250758 (2001-06-01), Yoshihara et al.
patent: 6274014 (2001-08-01), Matsumoto et al.
patent: 6287430 (2001-09-01), Matsumoto et al.
patent: 6297128 (2001-10-01), Kim et al.
patent: 6481369 (2002-11-01), Takahashi et al.
patent: 6503636 (2003-01-01), Le Massoon et al.
patent: 2003/0133124 (2003-07-01), Takahashi et al.
patent: 63-121801 (1998-05-01), None
patent: 11-131240 (1999-05-01), None

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