Ultra-low particle semiconductor cleaner

Details Ultra-low particle semiconductor cleaner Ultra-low particle semiconductor cleaner

1995-11-08

1998-06-30

El-Arini, Zeinab

Cleaning and liquid contact with solids

Processes

Including use of vacuum, suction, or inert atmosphere

134 254, 134 255, 134 26, 134 30, 134 37, 134902, B08B 304, B08B 500

Patent

active

057727848

ABSTRACT:
A method (400) for cleaning a semiconductor wafer. The method includes immersing (420) a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance during the providing step (450) also is included. The cleaning enhancement substance dopes the liquid which is attached to the front face and the back face to cause a concentration gradient of the cleaning enhancement substance in the attached liquid to accelerate fluid flow of the attached liquid off of the wafer.

REFERENCES:
patent: 4633893 (1987-01-01), McConnell et al.
patent: 4750505 (1988-06-01), Inuta et al.
patent: 4778532 (1988-10-01), McConnell et al.
patent: 4871417 (1989-10-01), Nishizawa et al.
patent: 4874014 (1989-10-01), Grant et al.
patent: 4911761 (1990-03-01), McConnell et al.
patent: 4917123 (1990-04-01), McConnell et al.
patent: 4984597 (1991-01-01), McConnell et al.
patent: 4987687 (1991-01-01), Sugimoto
patent: 5082518 (1992-01-01), Molinaro
patent: 5129955 (1992-07-01), Tanaka
patent: 5143103 (1992-09-01), Basso et al.
patent: 5156174 (1992-10-01), Thompson et al.
patent: 5169408 (1992-12-01), Biggerstaff et al.
patent: 5228206 (1993-07-01), Grant et al.
patent: 5286657 (1994-02-01), Bran
patent: 5421905 (1995-06-01), Ueno et al.
D.J. Riley and R.G. Carbonell, "The Deposition of Contaminants from Deionized Water onto Hydrophobic Silicon Wafers", Journal of the IES, pp. 28-34, Nov./Dec. 1991.
N.D. Casper and B.W. Soren, "Semiconductor Yield Enhancement through Particle Control", Emerging Semiconductor Technology, pp. 423-435.
M. Itano, F.W. Kern, Jr., R.W. Rosenberg, M. Miyashita, I. Kawanabe, and T. Ohmi, "Particle Deposition and Removal in Wet Cleaning Processes for ULSI Manufacturing", IEEE Trans. on Semiconductor Manufacturing, vol. 5, No. 2, pp. 114-120, May 1992.
Y. Yagi, T. Imaoka, Y. Kasama, and T. Ohmi, "Advanced Ultapure Water Systems with Low Dissolved Oxygen for Native Oxide Free Wafer Processing", IEEE Trans. On Semiconductor Manufacturing, vol. 5, No. 2, pp. 121-127, May 1992.
H.G. Parks, J.F. O'Hanlon. and F. Shadman, "Research Accomplishments at the University of Arizona Sematech Center of Excellence for Contamination/Defect Assessment and Control", IEEE Trans. on Semiconductor Manufacturing, vol. 6. No. 2, pp. 134-142, May 1993.
C.S. Ackerman and J.M. Fabia, "Monitoring Supplier Quality at PPM Levels", IEEE Trans. on Semiconductor Manufacturing, vol. 6. No. 2, pp. 189-194, May 1993.
G.D. Moss, J.N. DiBello, K.P. Yanders, and R.F. Orr, "Capillary Drying: Particle-Free Wet-Process Drying?" No date.
T. Ohmi, Ultra Clean Technology Handbook, p. 290, 1993.
J. Marra, "Ultra Clean Marangoni Drying", pp. 269-282 1993.
C. McConnell, "Examining the Effects of Wafer Surface Chemistry on Particle Remonval Using Direct-Displacement Isopropyl Alcohol Drying", MicroContamination, Feb. 1991.
P. Burggraaf, "Keeping the`RCA` in Wet Chemistry Cleaning ", Semiconductor International, pp. 86-90, Jun. 1994.
M.B. Olesen, "A Comparative Evaluation of the Spin Rinser/Dryer with the IPA Vapor Isodry Technique", Proceedings -Institute of Environmental Sciences, pp. 229-241, 1990.

Affiliated with

Also associated with

Rating

Ultra-low particle semiconductor cleaner does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ultra-low particle semiconductor cleaner, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultra-low particle semiconductor cleaner will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1854872