Ultra-low particle semiconductor apparatus

Details Ultra-low particle semiconductor apparatus Ultra-low particle semiconductor apparatus

1996-08-08

1997-11-11

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134 953, 1341023, 134902, B08B 304

Patent

active

056853270

ABSTRACT:
Apparatus for cleaning and drying a semiconductor wafer. The apparatus includes a vessel adapted to immerse a partially completed semiconductor wafer in a liquid comprising water. The apparatus also includes a control valve operably coupled to the vessel through a drain, and adapted to allow a gaseous mixture to displace the liquid in the vessel, where the liquid is displaced adjacent to the front face of the partially completed wafer. A controller is included. The controller is operably coupled to a plurality of nozzles. The controller can be used to pulse a drying fluid from the plurality of nozzles to the partially completed wafer to remove a possibility of liquid which may be attached to the partially completed wafer.

REFERENCES:
patent: 4917123 (1990-04-01), McConnell et al
patent: 4984597 (1991-01-01), McConnell et al.

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