Ultra-low level standard for concentration measurements

Measuring and testing – Instrument proving or calibrating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

378207, G01D 1800

Patent

active

058410163

ABSTRACT:
Concentration measurement equipment is calibrated by performing a concentration measurement on a reference standard sample which includes a radioactive marker element. Because a count of decay products can be correlated with the number of atoms of the radioactive marker element, a precise count of decay products of the radioactive marker element is used to calculate an otherwise unknown number of atoms of the radioactive marker element on the reference standard sample. The calculated number of atoms of radioactive marker element is then used to calibrate a concentration measurement of the radioactive marker element by the concentration measurement device. Suitable radioactive marker elements for use in calibrating concentration measurement equipment include Pm-147 and Tc-99. Materials, methods and systems in accordance with the teachings of the invention are useful for calibrating concentration measurements and measurement equipment, including Total X-ray Fluorescence (TXRF) and Time Of Flight-Secondary Ion Mass Spectroscopy (TOF-SIMS) measurements and measurement equipment.

REFERENCES:
patent: 3064130 (1962-11-01), Di Ianni et al.
patent: 3107299 (1963-10-01), Jachter
patent: 3519821 (1970-07-01), Bolster
patent: 3751661 (1973-08-01), Packer et al.
patent: 3859179 (1975-01-01), Staples
patent: 4092539 (1978-05-01), Pao et al.
patent: 4119847 (1978-10-01), Waggoner
patent: 4256960 (1981-03-01), Snider
patent: 4270052 (1981-05-01), King
patent: 4406947 (1983-09-01), Burton et al.
patent: 4510573 (1985-04-01), Boyce et al.
patent: 4524279 (1985-06-01), Christianson et al.
patent: 4771177 (1988-09-01), Brown
patent: 4779621 (1988-10-01), Mattson
patent: 4912323 (1990-03-01), Bhat et al.
patent: 4985906 (1991-01-01), Arnold
patent: 5024801 (1991-06-01), Impink, Jr. et al.
patent: 5164093 (1992-11-01), Chilton et al.
patent: 5210778 (1993-05-01), Massart
patent: 5373544 (1994-12-01), Goebel
patent: 5376803 (1994-12-01), McFee et al.
patent: 5497407 (1996-03-01), Komatsu et al.
patent: 5559324 (1996-09-01), Rapkin et al.
patent: 5637506 (1997-06-01), Goken et al.
Patent Abstracts of Japan Grp P1598, vol. 17, No. 461, Abs. p-6, dated Aug. 23, 1993 (05-107388) Ueda et al. "Method for Measuring Neutron Effective Multiplication Constant During Storage of Radiation Fuel.".
"Automatic Calibration of Radiation Monitoring films" Abstract, UKAEA Res. Group; AERE, Harwell, Berks., England; Report No. AERE-R6037, Mar. 1969.
John Volpe, "Bettis Reactor Engineering School Nuclear Physics Notes", Rev. 1; Topic 8--Radioactivity, pp. 8-1 to 8-8, Aug. 1988.
Minutes of ISO/TC201/WG2 on Total Reflection X-Ray Fluorescence Spectroscopy, ISO/TC 201/WG2 N 27, Jan. 29, 1996.
Third Working Draft, Surface Chemical Analysis--Determination Of Contamination Elements Contents On Silicone Wafer--Total Reflections X-Ray Fluorescence Spectroscopy (TXRF), ISO/TC 201/WG2 N 26, Nov. 27, 1995.
R. S. Hockett, Proceedings from the Denver X-Ray Conference, An Update on Standards Activity for TXRF and the Challenges Ahead, Aug. 1995, pp. 1-4.
R.S. Hockett, TXRF Detection of Subsurface Metals in Silicon Substrates, in the Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices, vol. 92-2, pp. 132-139. No Date.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ultra-low level standard for concentration measurements does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ultra-low level standard for concentration measurements, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultra-low level standard for concentration measurements will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1704770

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.