Ultra high speed uniform plasma processing system

Details Ultra high speed uniform plasma processing system Ultra high speed uniform plasma processing system

2004-07-13

2010-12-07

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345430, C156S345440, C156S345450, C156S345470

Reexamination Certificate

active

07845309

ABSTRACT:
An apparatus for processing a substrate with a plasma. The apparatus includes first and second electrodes positioned with a spaced apart relationship. A separating ring has a vacuum-tight engagement with confronting surfaces of the first electrode and the second electrode to define an evacuatable processing region therebetween. Communicating with the processing region is a process gas port for introducing a process gas to the processing region. The processing region may be evacuated through a vacuum port defined in one of the first and second electrodes to a pressure suitable for exciting a plasma from the process gas in the processing region when the first and second electrodes are powered.

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