Ultra high speed complementary MOS device

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 23, 357 41, 357 46, 357 55, 357 56, H01L 2702

Patent

active

042297567

ABSTRACT:
An improved, ultra high speed (2GHz) CMOS inverter structure comprising a double-diffused, planar p-channel transistor and a nonplanar n-channel transistor formed within adjacent surface fields on the same substrate. The n-channel device includes a source region formed in an elevated, plateau region on the substrate, and a narrow, implanted channel-forming layer that extends through the plateau beneath the source region and terminates at a slope joining the plateau to surrounding lower elevation portions of the substrate. A drain region is formed adjacent the foot of the slope, spaced from the channel to provide a drift region between them.

REFERENCES:
patent: 3823352 (1974-07-01), Pruniaux et al.
patent: 4063274 (1977-12-01), Dingwall
Electronics-Dec. 7, 1978, pp. 41-42.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ultra high speed complementary MOS device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ultra high speed complementary MOS device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultra high speed complementary MOS device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2026015

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.