Ultra-high frequency device for depositing thin films on solids

Details Ultra-high frequency device for depositing thin films on solids Ultra-high frequency device for depositing thin films on solids

1980-05-16

1982-03-23

Pianalto, Bernard D.

Coating apparatus

Gas or vapor deposition

With treating means

118 501, 118725, 118728, 118733, C23C 1308

Patent

active

043207162

ABSTRACT:
A device having means for forming a high frequency excitation zone in an elongated enclosure, a vacuum pump whose connection is positioned at one end of the enclosure, a device permitting the injection into the enclosure of a gaseous mixture containing at least one compound of the substance to be deposited in the vicinity of but outside the excitation zone. The solid on which the deposit is to be made is positioned in the enclosure. The deposition area on said solid is limited to an area of the enclosure outside the high frequency excitation zone in which the gaseous mixture is almost completely decomposed by high energy particles emitted in said zone.

REFERENCES:
patent: 3297465 (1967-01-01), Connell et al.
patent: 3886896 (1975-06-01), Cakenberghe

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