Two-step method for etching a fuse window on a semiconductor...

Details Two-step method for etching a fuse window on a semiconductor... Two-step method for etching a fuse window on a semiconductor...

2006-12-27

2009-11-24

Chen, Kin-Chan (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S700000, C438S702000

Reexamination Certificate

active

07622395

ABSTRACT:
A two-step method for etching a fuse window on a semiconductor substrate is provided. A semiconductor substrate having thereon a fuse interconnect-wire is formed in a dielectric film stack. The dielectric film stack includes a target dielectric layer overlying said fuse interconnect-wire, an intermediate dielectric layer and a passivation layer. A photoresist layer is formed on the passivation layer with an opening that defines said fuse window. A first dry etching process is performed to non-selectively etch the passivation layer and the intermediate dielectric layer through the opening thereby exposing the target dielectric layer. The thickness of the target dielectric layer after the first dry etching process is then measured. An APC-controlled second dry etching process is performed to etch a portion of the exposed target dielectric layer, thereby reliably forming the fuse window.

REFERENCES:
patent: 5989784 (1999-11-01), Lee
patent: 6194318 (2001-02-01), Ikeda
patent: 6300252 (2001-10-01), Ying
patent: 6677226 (2004-01-01), Bowen et al.
patent: 6911386 (2005-06-01), Lee et al.
patent: 7144749 (2006-12-01), Ng et al.
patent: 2002/0079552 (2002-06-01), Koike
patent: 2004/0171263 (2004-09-01), Choi et al.
patent: 2005/0087837 (2005-04-01), Omura et al.
patent: 2005/0189612 (2005-09-01), Hung et al.
patent: 2005/0233515 (2005-10-01), Ng et al.

Affiliated with

Also associated with

Rating

Two-step method for etching a fuse window on a semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Two-step method for etching a fuse window on a semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Two-step method for etching a fuse window on a semiconductor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4094366